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Articles by author: Hayato Iwamoto

• Defects of Silicon Substrates Caused by Electro-Static Discharge in Single Wafer Cleaning Process
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p185)
• Direct Mixing Cleaning Method of Aqua Regia on Wafer
  Published in: Ultra Clean Processing of Silicon Surfaces VII (p245)
• Evaluation of the Plasmaless Gaseous Etching Process
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p7)
• Mechanism of Plasma-Less Gaseous Etching Process for Damaged Oxides from the Ion Implantation Process
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p227)
• New Brush Scrubbing Techniques for a Wafer Bevel, Apex and Edge
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p205)
• Novel Chemical Etching to Correct Film Thickness Distributions
  Published in: Ultra Clean Processing of Silicon Surfaces VII (p111)
• Novel Photo Resist Stripping for Single Wafer Process
  Published in: Ultra Clean Processing of Silicon Surfaces VII (p297)