Articles by author: James Snow

Aging Phenomena in the Removal of Nano-Particles from Si Wafers
Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p155)
All Wet Photoresist Strip by Solvent Aerosol Spray
Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p285)
Application of Single-Wafer Wet Cleaning Prior to Epitaxial SiGe Process
Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p173)
Challenges of Single-Wafer Wet Cleaning for Low Temperature Pre-Epitaxial Treatment of SiGe
Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p243)
Evaluation of Megasonic Cleaning for Sub-90nm Technologies
Published in: Ultra Clean Processing of Silicon Surfaces VII (p141)
Impact of Galvanic Corrosion on Metal Gate Stacks
Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p215)
Influence of Hardware and Chemistry on the Removal of Nano-Particles in a Megasonic Cleaning Tank
Published in: Ultra Clean Processing of Silicon Surfaces VI (p143)
Influences of Oxide Loss on Contamination Removal
Published in: Ultra Clean Processing of Silicon Surfaces VII (p177)
Removal of Nano-Particles by Mixed-Fluid Jet: Evaluation of Cleaning Performance and Comparison with Megasonic
Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p193)
Removal of Small (<100-nm) Particles and Metal Contamination in Single-Wafer Cleaning Tool
Published in: Ultra Clean Processing of Silicon Surfaces VI (p157)
Selective Wet Removal of Hf-Based Layers and Post-Dry Etch Residues in High-k and Metal Gate Stacks
Published in: Ultra Clean Processing of Silicon Surfaces VII (p93)
Single Chemistry Cleaning Solutions for Advanced Wafer Cleaning
Published in: Ultra Clean Processing of Silicon Surfaces VI (p27)
Single-Wafer Wet Chemical Oxide Formation for Pre-ALD High-k Deposition on 300 mm Wafer
Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p53)
Wafer Backside Cleaning Strategies for High-k/Metal Gate Processing
Published in: Ultra Clean Processing of Silicon Surfaces VII (p241)