Papers by Author: Martin S. Janson

Paper TitlePage

Abstract: A brief survey is given of some recent progress regarding ion implantation processing and related effects in 4H- and 6H-SiC. Four topics are discussed; an empirical ion range distribution simulator, dynamic defect annealing during implantation, formation of highly p+-doped layers, and deactivation of N donors by ion-induced defects.
781
637
917
641
1419
779
565
597
427
Showing 1 to 10 of 17 Paper Titles