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Articles by author: Sébastien Petitdidier

• Copper Surface Analysis with ToF-SIMS: Spectra Interpretation and Stability Issues
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p371)
• Dual Gate Oxide for 0.18μm Technologies and Below: Optimization of the Wet Processing Sequence
  Published in: Ultra Clean Processing of Silicon Surfaces V (p27)
• Effect of an Organic Inhibitor in High pH Chemical Rinse on the Platen for Cu-CMP
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p299)
• Electrochemical Study for the Characterization of Wet Silicon Oxide Surfaces
  Published in: Ultra Clean Processing of Silicon Surfaces V (p81)
• Impact of Megasonic Activation with Different Chemistries on Silicon Surface in Single Wafer Tool
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p15)
• Influence of the Process Conditions of a Polishing Rinse after CuCMP
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p375)
• Modelling the Growth of Chemical Oxide for Advanced Surface Preparation
  Published in: Ultra Clean Processing of Silicon Surfaces VI (p187)
• Optimisations of SC-1 Conditions for Sub 0.18μm Technologies in an Industrial Environment
  Published in: Ultra Clean Processing of Silicon Surfaces V (p93)
• 'Resist / Wet Etch' Couple for Dual Gate Oxide
  Published in: Ultra Clean Processing of Silicon Surfaces VI (p235)