Papers by Keyword: 6H-SiC

Abstract: Over the past year, II-VI has transitioned from 2” to 3” commercial SiC substrates. Large-diameter semi-insulating 6H-SiC and n-type 4H-SiC single crystals are grown using the Advanced PVT growth process. Expansion of boule diameter from 2 to 3 and up to 4.25 inches has been carried out using a specially designed growth technique. Stable semi-insulating properties in 6H-SiC are achieved by precise vanadium compensation. The technique of compensation is optimized to produce a controlled and spatially uniform distribution of vanadium and high and spatially uniform electrical resistivity reaching 10 10 – 1011
·cm. N-type 3-inch 4H-SiC crystals are grown using doping with nitrogen, and 3-inch 4H-SiC substrates show uniform resistivity of about 0.018
·cm. The best quality semiinsulating (SI) 3” 6H-SiC substrates demonstrate micropipe density of 3 cm-2, and n-type 3” 4H-SiC substrates - about 1 cm-2. X-ray rocking curve topography of the produced 3” SiC substrates is used for evaluation of their crystal quality.

Abstract: Lateral inversion channel metal-oxide-semiconductor field-effect transistors (MOSFETs) were manufactured on 6H-SiC and two gate oxidation recipes were compared. In one case the gate oxide was grown in N2O using quartz environment. The resulting peak field-effect mobility was µFE=43 cm2/Vs. In the other case the gate oxide was grown in oxygen using alumina environment and the resulting peak field-effect mobility was µFE=130 cm2/Vs. Oxidizing in an environment made from sintered alumina introduces contaminants into the oxide that effect the oxidation in several^ways. The oxidation rate is increased and the resulting SiC/SiO2 interface allows higher inversion channel mobility.

Abstract: Atomic Layer Deposited Al2O3 films on hydrogen-terminated 6H-SiC(0001) were annealed in hydrogen atmosphere and characterized by admittance spectroscopy measurement and photoelectron spectroscopy (PES). The resultant density of interface trap (Dit) from admittance spectroscopy measurement is reduced near mid gap, but increases strongly towards the conduction band edge. Systematic PES measurements show that hydrogen annealing introduces Si4+ as a new component besides Si0 and Si+. Using different electron escape depths for photon electrons, depth profiling of Si in its different oxidation states was performed. The result indicates the formation of a top SiO2 layer and a rougher interfacial layer containing more Si+ and Si4+ which could be responsible for the strong increase of Dit just below the conduction band edge.

Abstract: This paper presents positron lifetime results which give information on the nature of vacancy defects induced by electron irradiation in bulk nitrogen doped (nD-nA= 2.3x1017 cm-3) Cree 6H-SiC. The electron irradiations have been performed at different energies and with different fluences from 5􀂗1017 e-cm-2 to 3􀂗1018 e-cm-2. Positron lifetime have been measured with a 22NaCl source as a function of temperature between 15 and 300 K. The lifetime spectra were analyzed as sums of two exponential lifetime components 􀁗i weighted by the intensities Ii, convoluted with the resolution function. From the temperature dependence of the lifetime spectra we can infer that several vacancy defects exist in the electron irradiated n-type 6H-SiC. The nature of detected vacancy defects depends on the electron energy.

Abstract: Photoluminescence (PL) and time resolved PL are well established as important experimental techniques to study electronic properties of SiC. We studied the influence of ionimplantation on the photoluminescence peak at 423nm and the variation of the minority carrier lifetime (MCL).

Abstract: X-Ray Diffraction Topography (XRDT) and Optical Microscopy (OM) are adopted to study extended structural defects in 6H-SiC bulky crystals. Topographs are taken by means of White Beam Synchrotron Radiation Source (WB-SRS-XRDT) and by means of monochromatic radiation (MoKα1) with conventional source (Lang method). All studied samples are characterised by the presence of linear defects, dislocations and microchannels, uniformly distributed in the crystal. Such defects draw a net of independent systems of parallel lines, with different orientation and different contrast widths. Micro-channels are parallel to the c axis, whereas dislocations are perpendicular or nearly parallel to the c axis. The last are unit screw dislocations. It has been concluded that the growth mechanism is driven by screw dislocations and that channels results from the coalescence of parallel dislocations.

Abstract: We present experimental results with regard to the evaluation of growth-induced polytype domains in 6H-SiC crystals grown by sublimation method and these domains are characterized by using the polarized optical microscopy and micro-Raman spectroscopy. The polytype domains of reverse triangular are generated by local variation of temperature along cdirection and spread-wing shapes normally occurred forming micropipes in many cases. These polytype domains may be generated due to the local variation of supersaturation and/or temperature at central position during crystal growth. In this work, we try to elucidate the origin and mechanism responsible for growth-induced polytype domains.

Abstract: Several highly aluminum doped SiC bulk crystals were grown with a modified PVT (MPVT) method. To facilitate 4H-SiC formation, growth was conducted on the C-face. The samples were investigated using Hall measurements in the Van-der-Pauw geometry. Lowest room temperature values for specific resistivities were 0.09 Ωcm for 6H-SiC and 0.2 Ωcm for 4H-SiC, which are to our knowledge the lowest values yet reported in literature. Thus, resistivity values of < 0.2 Ωcm, which are required for substrates in high power device applications, could be demonstrated for 4HSiC. Remarkably, in very highly doped samples the type of conduction could not be determined by Hall measurements.

Abstract: 4H-SiC crystals were grown using the seeded sublimation technique (modified Lely technique) in the temperature range of 1950-2200°C. The nucleation of 4H-SiC on 6HSiC has been optimized and 4H-SiC crystals of 1cm thickness were grown using 6H-SiC seeds. a-face and c-face wafers obtained from the grown boules were characterized by KOH etching, X-ray diffraction, and Raman scattering studies. Complete polytypic homogeneity of 4H SiC was obtained during growth and it was found that the 6H to 4H transition occurs in three ways: 1) without a transition layer, 2) with thick 6H-SiC layer growth, and 3) with traces of 3C SiC inclusions. The crown regions of the grown crystals exhibit an X-ray rocking curve width of 21 arcsecs.

Abstract: We examined the formation of poly-crystals and polytypes under the point of view applying various powder phases. 6H-SiC single crystal was easily grown by using the green (α-SiC) powder, while the poly-crystals were generated when β-SiC powder was utilized. The method of mixed β-SiC and carbon powder and of graphite pipe inserted in β-SiC powder were applied to overcome the generation of poly-crystals, respectively. It was confirmed that the occurrence of poly-crystals in 6H-SiC crystal was successfully suppressed by C-rich environment.