Keyword: "Atomic Layer Deposition ALD"
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Characteristics of ZrO2/Al2O3 Bilayer Film for Gate Dielectric Applications Deposited by Atomic Layer Deposition Method

Authors: Yang Do Kim, Jang Hee Lee, Jae Hyoung Koo, Ho Jung Chang, Hyeong Tag Jeon

497

Characterization of Aluminium and Titanium Oxides Deposited on 4H-SiC by Atomic Layer Deposition Technique

Authors: Maciej Wolborski, Mietek Bakowski, Viljami Pore, Mikko Ritala, Markku Leskelä, Adolf Schöner, Anders Hallén

701

Chemical and Electrical Properties of ZnS Deposited with DEZ and H2S by Atomic Layer Deposition Method

Authors: Seoung Woo Kuk, Seok Hwan Bang, In Hoe Kim, Sun Yeol Jeon, Hyeong Tag Jeon, Hyung Ho Park, Ho Jung Chang

689

Electrical Properties of Atomic-Layer-Deposited La2O3/Thermal-Nitrided SiO2 Stacking Dielectric on 4H-SiC(0001)

Authors: Jeong Hyun Moon, Kuan Yew Cheong, Da Il Eom, Ho Keun Song, Jeong Hyuk Yim, Jong Ho Lee, Hoon Joo Na, Wook Bahng, Nam Kyun Kim, Hyeong Joon Kim

643

Fabrication of Oxide/Semiconducting Coaxial Nanotubular Materials Using Atomic Layer Deposition

Authors: D.K. Jeong, N.H. Park, S.-H. Jung, Woo Gwang Jung, H. Shin, J.G. Lee, J.Y. Kim

1165

Field Effect Transistor with ZnS Active Layer on ITO/Glass Substrate

Authors: In Jae Back, Su Cheol Gong, Hun Seoung Lim, Ik Sub Shin, Seoung Woo Kuk, In Hoe Kim, Hyeong Tag Jeon, Hyung Ho Park, Ho Jung Chang

753

On the Application of a Thin Ozone Based Wet Chemical Oxide as an Interface for ALD High-k Deposition

Authors: Bart Onsia, Matty Caymax, Thierry Conard, Stefan de Gendt, F. De Smedt, A. Delabie, C. Gottschalk, Marc M. Heyns, M. Green, S. Lin, Paul W. Mertens, W. Tsai, Chris Vinckier

19

Production Worthy ALD in Batch Reactors

Authors: Alexander Gschwandtner

181

Single-Wafer Wet Chemical Oxide Formation for Pre-ALD High-k Deposition on 300 mm Wafer

Authors: Kenichi Sano, Akira Izumi, Atsuro Eitoku, James Snow, L. Nyns, S. Kubicek, R. Singanamalla, O. Richard, Thierry Conard, Rita Vos, Paul W. Mertens

53

Surface Preparation Techniques for High-k Deposition on Ge Substrates

Authors: Sven Van Elshocht, A. Delabie, B. Brijs, Matty Caymax, Thierry Conard, Bart Onsia, Riikka Puurunen, Olivier Richard, Jan Van Steenbergen, Chao Zhao, Marc Meuris, Marc M. Heyns

31

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