| Paper Title | Page |
|---|---|
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Authors: Yang Do Kim, Jang Hee Lee, Jae Hyoung Koo, Ho Jung Chang, Hyeong Tag Jeon |
497 |
|
Authors: Maciej Wolborski, Mietek Bakowski, Viljami Pore, Mikko Ritala, Markku Leskelä, Adolf Schöner, Anders Hallén |
701 |
|
Authors: Seoung Woo Kuk, Seok Hwan Bang, In Hoe Kim, Sun Yeol Jeon, Hyeong Tag Jeon, Hyung Ho Park, Ho Jung Chang |
689 |
|
Authors: Jeong Hyun Moon, Kuan Yew Cheong, Da Il Eom, Ho Keun Song, Jeong Hyuk Yim, Jong Ho Lee, Hoon Joo Na, Wook Bahng, Nam Kyun Kim, Hyeong Joon Kim |
643 |
|
Fabrication of Oxide/Semiconducting Coaxial Nanotubular Materials Using Atomic Layer Deposition Authors: D.K. Jeong, N.H. Park, S.-H. Jung, Woo Gwang Jung, H. Shin, J.G. Lee, J.Y. Kim |
1165 |
|
Field Effect Transistor with ZnS Active Layer on ITO/Glass Substrate Authors: In Jae Back, Su Cheol Gong, Hun Seoung Lim, Ik Sub Shin, Seoung Woo Kuk, In Hoe Kim, Hyeong Tag Jeon, Hyung Ho Park, Ho Jung Chang |
753 |
|
Authors: Bart Onsia, Matty Caymax, Thierry Conard, Stefan de Gendt, F. De Smedt, A. Delabie, C. Gottschalk, Marc M. Heyns, M. Green, S. Lin, Paul W. Mertens, W. Tsai, Chris Vinckier |
19 |
|
Production Worthy ALD in Batch Reactors Authors: Alexander Gschwandtner |
181 |
|
Single-Wafer Wet Chemical Oxide Formation for Pre-ALD High-k Deposition on 300 mm Wafer Authors: Kenichi Sano, Akira Izumi, Atsuro Eitoku, James Snow, L. Nyns, S. Kubicek, R. Singanamalla, O. Richard, Thierry Conard, Rita Vos, Paul W. Mertens |
53 |
|
Surface Preparation Techniques for High-k Deposition on Ge Substrates Authors: Sven Van Elshocht, A. Delabie, B. Brijs, Matty Caymax, Thierry Conard, Bart Onsia, Riikka Puurunen, Olivier Richard, Jan Van Steenbergen, Chao Zhao, Marc Meuris, Marc M. Heyns |
31 |