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Articles by keyword: «Resist Strip»

• Accelerated Removal of Photoresist for Semiconductor Production by an Increased-Pressure Ozone and Water Vapor Process
  Published in: Ultra Clean Processing of Silicon Surfaces VI (p227)
• Activated He:H₂ Strip of Photoresist over Porous Low-k Materials
  Published in: Ultra Clean Processing of Silicon Surfaces VII (p341)
• Qualification of Resist Strip Process for Ultra Low-k/Cu Interconnect
  Published in: Ultra Clean Processing of Silicon Surfaces VII (p345)
• Resist Strip and Cu Diffusion Barrier Etch in Cu BEOL Integration Schemes in a Mattson Highlands^TM Chamber
  Published in: Ultra Clean Processing of Silicon Surfaces VI (p267)
• Study of a Metal Gate and Silicon Selective “Dry Ash Only” Process for Combined Extension and Halo Implanted Photo Resist
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p113)
• Study of Resist Strip Chemistries for Ultra Low-k/Cu Interconnect
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p351)