Self-Assembly Nanofabrication via Mussel-Inspired Interfacial Engineering
We present that polydopamineassistedinterfacial engineering can be synergistically integratedwith block copolymer lithography for surface nanopatterningof low-surface-energy substrate materials, includingTeflon, graphene, and gold. Block copolymer lithography is aself-assembly based nanofabrication that holds greatpromise for sub-10-nm scale patterning. The directed self-assemblyof block copolymers into device-oriented nanopatternsgenerally requires organic modification of a substrate surface.In this work, the versatility of the polydopamine treatment was demonstrated by the surface modification.
Y. J. Choi et al., "Self-Assembly Nanofabrication via Mussel-Inspired Interfacial Engineering", Applied Mechanics and Materials, Vols. 229-231, pp. 2749-2752, 2012