Self-Assembly Nanofabrication via Mussel-Inspired Interfacial Engineering

Abstract:

We present that polydopamineassistedinterfacial engineering can be synergistically integratedwith block copolymer lithography for surface nanopatterningof low-surface-energy substrate materials, includingTeflon, graphene, and gold. Block copolymer lithography is aself-assembly based nanofabrication that holds greatpromise for sub-10-nm scale patterning. The directed self-assemblyof block copolymers into device-oriented nanopatternsgenerally requires organic modification of a substrate surface.In this work, the versatility of the polydopamine treatment was demonstrated by the surface modification.

• Periodical: Applied Mechanics and Materials (Volumes 229-231)
• Pages: 2749-2752
• DOI: https://doi.org/10.4028/www.scientific.net/AMM.229-231.2749
• Online since: November 2012
• Authors: Young Joo Choi, Hyeong Min Jin, Bong Hoon Kim, Ju Young Kim, Sang Ouk Kim
• Keywords: Block Copolymer Lithography, Surface Chemistry

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