Self-Assembly Nanofabrication via Mussel-Inspired Interfacial Engineering

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We present that polydopamineassistedinterfacial engineering can be synergistically integratedwith block copolymer lithography for surface nanopatterningof low-surface-energy substrate materials, includingTeflon, graphene, and gold. Block copolymer lithography is aself-assembly based nanofabrication that holds greatpromise for sub-10-nm scale patterning. The directed self-assemblyof block copolymers into device-oriented nanopatternsgenerally requires organic modification of a substrate surface.In this work, the versatility of the polydopamine treatment was demonstrated by the surface modification.

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Periodical:

Edited by:

Mohamed Othman

Pages:

2749-2752

DOI:

10.4028/www.scientific.net/AMM.229-231.2749

Citation:

Y. J. Choi et al., "Self-Assembly Nanofabrication via Mussel-Inspired Interfacial Engineering", Applied Mechanics and Materials, Vols. 229-231, pp. 2749-2752, 2012

Online since:

November 2012

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$38.00

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