Quantum State in Fabricating Silica Antireﬂective Coatings

Rui Min Jin; Zhi Duan Cai; Li Min Cang; Tao Yan

doi:10.4028/www.scientific.net/AMM.271-272.247

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HomeApplied Mechanics and MaterialsApplied Mechanics and Materials Vols. 271-272Quantum State in Fabricating Silica Antireﬂective...

Quantum State in Fabricating Silica Antireﬂective Coatings

Abstract:

Based on TEOS system and sol-gel process, together with catalysts, Antireﬂective coating films prepared by sol—gel on glass substrate have been processed by rapid thermal annealing (RTA). the refractive index and thinkness of SiO2 film is exactly controlled. The films are characterized by ellipsometer and SEM respectively. The quantum states in these processions are found and discussed.

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Applied Mechanics and Materials (Volumes 271-272)

Pages:

247-250

DOI:

https://doi.org/10.4028/www.scientific.net/AMM.271-272.247

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Online since:

December 2012

Authors:

Rui Min Jin, Zhi Duan Cai, Li Min Cang, Tao Yan

Keywords:

Antireﬂective Coating, Quantum State, Rapid Thermal Annealing (RTA)

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