The Analysis of the Built-in Electric Field and the Migration of Carries in Thermal/Electric-Field Poled Fused Silica

Abstract:

The thermal/electric poling process of fused silica glass is analyzed based on the multi-carriers’ model. The carrier continuity equation is applied to calculate the variation of the carrier concentration with time. The border of positive charge and negative charge is analogous to a p-n junction. Calculation of the built-in electric field is based on the Poisson equation. The result shows that the second-order nonlinearity effect is mainly formed by the Na+ depletion in the poled fused silica glass. The non-linear coefficient is calculated, it is agree well with the literature values, which verifies the reliability of the theory. The study provided theoretical foundation for manufacture optical communication components.

• Periodical: Applied Mechanics and Materials (Volume 273)
• Pages: 496-501
• DOI: https://doi.org/10.4028/www.scientific.net/AMM.273.496
• Online since: January 2013
• Authors: Zheng Quan Dai, Jin Yan Duan, Jian Wang, You Li, Yi Tao Ren
• Keywords: Built-In Electric Field, Optical Communication, p-n Junction, Second-Order Nonlinearity, Thermal/Electric-Field Poling

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