Annealing Effects on Hydrophobic AlN Coatings

Abstract:

The effects of annealing at various annealing temperature on hydrophobic AlN coatings were investigated. AlN coatings were deposited in Ar/N2 plasma by using reactive magnetron sputtering process. Two medium frequency (MF) powered Al targets were used. AlN coatings were annealed in air at 300°C, 600°C, 700°C, 800°C, 900°C, 1000°C and 1100°C, respectively. The hydrophobic and hydrophilic properties were evaluated by using water contact angle (WCA) measurement. Microstructure and morphology were observed using X-ray diffraction (XRD), scanning electron microscopy (SEM) and X-ray Photoelectron Spectrometer (XPS), respectively. According to the results revealed by XRD and SEM, AlN possess hexagonal close-packed (hcp) structures and good crystallization. The morphology of AlN coating after annealing at 800°C is still similar to the as-deposited AlN coating. As the annealing temperature increases to 1000°C, the XRD peaks of Al2O3 phase can be clearly identified. The main XRD peaks of the AlN coatings still can be found after annealing at 1100°C. The as-deposited AlN coating exhibits hydrophobic behavior and the highest WCA of 119°. As the annealing temperature increases to 300°C, the WCA decreases sharply to 77°. The lower WCA of AlN coatings obtained after annealing is related to the Al2O3 thin films upon AlN coatings.

• Periodical: Applied Mechanics and Materials (Volumes 284-287)
• Pages: 276-280
• DOI: https://doi.org/10.4028/www.scientific.net/AMM.284-287.276
• Online since: January 2013
• Authors: Yu Sen Yang, Ting Pin Cho, Jia Hau Lin
• Keywords: Aluminum Nitride (AlN), Annealing, Hydrophobic Property, Magnetron Sputtering

References

[1] W.H. Kao and Mater: Sci. Eng., Vol. A 432 (2006), p.253.

[2] S.K. Pradhan, C. Nouveau, A. Vasin and M. -A. Djouadi: Surf. Coat. Technol. Vol. 200 (2005), p.141.

[3] B. Navinšek, P. Panjan and A. Cvelbar: Surf. Coat. Technol. Vol. 74-75 (1995), p.155.

[4] Anders Persson, Jens Bergström, Christer Burman and Sture Hogmark: Surf. Coat. Technol. Vol. 146 -147 (2001), p.42.

[5] W. Ernst, J. Neidhardt, H. Willmann, B. Sartory, P.H. Mayrhofer and C. Mitterer: Thin Solid Films Vol. 517 (2008), p.568.

DOI: 10.1016/j.tsf.2008.06.086

[6] Alexandru Andrei, Katarzyna Krupa, Michal Jozwik, Patrick Delobelle, Laurent Hirsinger, Christophe Gorecki, Lukasz Nieradko and Cathy Meunier: Sens. Actuators A Vol. 141, (2008), p.565.

DOI: 10.1016/j.sna.2007.10.041

[7] Jianhua Wang, Danqing Yi, Xuping Su, Fucheng Yin and Hongwu Li: Mater. Des. Vol. 30 (2009), p.78.

[8] Kiyoshi Mizuuchi, Kanryu Inoue, Yasuyuki Agari, Toru Nagaoka, Masami Sugioka, Motohiro Tanaka, Takashi Takeuchi, Jun-ichi Tani, Masakazu Kawahara, Yukio Makino and Mikio Ito: Composites Part B Vol. 43 (2011), p.1557.

DOI: 10.1016/j.compositesb.2011.06.017

[9] Hikmet Altun and Sadri Sen: Mater. Des. Vol. 27 (2006), p.1174.

[10] F. Vacandio, Y. Massiania, P. Gergaud and O. Thomas: Thin Solid Films Vol. 359 (2000), p.221.

[11] R. Boichot, A. Claudel, N. Baccar, A. Milet, E. Blanquet and M. Pons: Surf. Coat. Technol. Vol. 205 (2010), p.1294.

DOI: 10.1016/j.surfcoat.2010.08.049

[12] A. Guillaumot, F. Lapostolle, C. Dublanche-Tixier, J.C. Oliveira, A. Billard and C. Langlade: Vacuum Vol. 85 (2010), p.120.

DOI: 10.1016/j.vacuum.2010.04.012

[13] S.M. Chiu, S.J. Hwang, C.W. Chu and Dershin Gan: Thin Solid Films Vol. 515 (2006), p.285.

[14] Yu-Sen Yang and Wesley Huang: Smart Mater. Struct. Vol. 19 (2010), 124003.

[15] H. Bartzsch and P. Frach: Surf. Coat. Technol. Vol. 142-144 (2001), p.192.

[16] T. Young: Phil. Trans. R. Soc. (London) Vol. 95 (1805), p.65.

[17] C. Yang, U. Tartaglino and B. N. J. Persson: Phys. Rev. Lett. Vol. 97 (2006), 116103.