Simulation of Acoustic Field for Megasonic Bath Cleaning in Advanced Semiconductor Manufacturing

Abstract:

Megasonic cleaning has been one of the most successful techniques for nanoparticle cleaning in semiconductor industry. However, the megasonic energy often causes a pattern collapse and some damage to very small structure. In this study, the distribution of sonic pressure in a wet cleaning bath with different arrangement of megasonic transducers is simulated. Megasonic wave transmits directional and will be disturbed. Thus the wafer surfaces should be arranged parallel to the sound wave direction of propagation. Convergence gain in the whole cleaning space is limited but results in great variance in local areas. Thus the wafer moving, rotating and oscillating is necessary.

• Periodical: Applied Mechanics and Materials (Volume 289)
• Pages: 81-86
• DOI: https://doi.org/10.4028/www.scientific.net/AMM.289.81
• Online since: February 2013
• Authors: Ya Ting Huang, Xiu Ping Dong
• Keywords: Acoustic Field, Computer Simulation, Megasonic, Nanoparticle

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