Investigation on AZO Films Deposited by Radio-Frequency Reactive Magnetron Sputtering

Abstract:

The Al₂O₃-doped ZnO(AZO) films were deposited on the glasses by means of RF magnetron sputtering technology. The films were characterized by scanning electron microscope (SEM), X-ray diffraction (XRD) and Profile-system respectively. The effect of substrate temperature on the structure of the AZO films is investigated.As a result, the properties of the AZO thin films are remarkably influenced by the substrate temperature , especially in the range of 200°C to 500 °C. The film prepared at the substrate temperature of 400°C possesses the best crystalline.

• Periodical: Applied Mechanics and Materials (Volume 320)
• Pages: 35-39
• DOI: https://doi.org/10.4028/www.scientific.net/AMM.320.35
• Online since: May 2013
• Authors: Cheng Long Kang, Jin Xiang Deng, Min Cui, Chao Man, Le Kong, Ping Yang
• Keywords: AZO Film, Magnetron Sputtering, Substrate Temperature

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