Research and Design on Digital Mask Lithography Control System

Abstract:

In order to cover the shortage of manual control method and semi-automatic control method on digital mask lithography system, a full-automatic and intelligent digital mask lithography control system is designed. The block hardware framework and the modular software design theory are adopted in the system. Lithography process is controlled by center computer, and the system can realize precision motion control, digital mask graphics output control, precision exposure control and exposure real-time monitoring control, which can improve the stability, the reliability and the flexibility of digital lithography system.

• Periodical: Applied Mechanics and Materials (Volumes 416-417)
• Pages: 957-961
• DOI: https://doi.org/10.4028/www.scientific.net/AMM.416-417.957
• Online since: September 2013
• Authors: Yi Qing Gao, Ping Qi Wang, Zhao Jun Shi, Ning Ning Luo
• Keywords: Control System, Digital Lithography, Digital Mask, Micro-Optics Element (MOE)

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