Improvement of Thermal Stability of ZrB2/Si3N4 Coatings as High-Temperature Solar Selective Absorbers

Yao Ming Sun; Xiu Di Xiao; Guan Qi Chai; Gang Xu; Bin Xiong; Hua Zhang

doi:10.4028/www.scientific.net/AMM.521.581

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Fabrication of Three-Dimensional Porous Sn Films as Anode for Li-Ion Batteries
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Preparation of Cu₂ZnSnS₄ Thin Films by Hydrothermal Method
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A Simple Nanocasting Route for Preparation of Mesoporous Titanium Dioxide/GCM Microsphere
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Improvement of Thermal Stability of ZrB₂/Si₃N₄ Coatings as High-Temperature Solar Selective Absorbers
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A Comparative Investigation of the Electrocatalytic Oxidation of Methanol on Pt Modified TiO₂ Nanotube Electrodes with Two Methods
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Excess Heat Production in a Deuterium/Palladium Gas-Solid System
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Design and Analytical and Numerical Calculation of Pressure Vessel for Hydrogen Gas
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Determining Temperature Regulating Factor for Refrigeration Engineering Phase Change Material
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HomeApplied Mechanics and MaterialsApplied Mechanics and Materials Vol. 521Improvement of Thermal Stability of ZrB2/Si3N4...

Improvement of Thermal Stability of ZrB₂/Si₃N₄ Coatings as High-Temperature Solar Selective Absorbers

Abstract:

ZrB₂ thin films were prepared by DC magnetron sputtering technique. The microstructure, thermal stability and optical properties of thin films were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM) and spectrophotometer. The compactness of ZrB₂ thin films was studied to improve the thermal stability by optimizing the deposition parameters. The compactness and thermal stability of the coatings were improved with the increase of substrate temperature. However, these properties of the coatings were enhanced firstly and then weakened with the increase of substrate bias voltage. The selectivity of sample deposited at high substrate temperature and suitable bias voltage degraded slightly after annealing at 500 °C/100 h in air. This provided a new way to improve the thermal stability of high-temperature solar selective absorber.