Ultraviolet LED Light Source System for Lithography

Guo Gui Wang; Yi Qing Gao; Meng Chao Xiao

doi:10.4028/www.scientific.net/AMM.667.405

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HomeApplied Mechanics and MaterialsApplied Mechanics and Materials Vol. 667Ultraviolet LED Light Source System for...

Ultraviolet LED Light Source System for Lithography

Abstract:

We designed a lithographic system, which consists of an ultraviolet LED array as the source, a Compound Parabolic Collector (CPC) as the light collection and collimator, a double fly’s eye len and a convergent lens as light energy Homogenization unit. The second fly’s lens as a field lens is placed to the back focal plane of the first one to improve the light energy uniformity as the light rays output from the CPC are not strictly parallel. The simulation based on optical software indicated that the lithographic system is good at collecting and distributing uniformly light energy. It is a better solution as ultraviolet LED is good at space, price, Environmental Protection compared with Ultraviolet (UV) laser and high pressure mercury lamp.

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Periodical:

Applied Mechanics and Materials (Volume 667)

Pages:

405-408

DOI:

https://doi.org/10.4028/www.scientific.net/AMM.667.405

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Online since:

October 2014

Authors:

Guo Gui Wang*, Yi Qing Gao, Meng Chao Xiao

Keywords:

CPC, Fly’s Lens, Lithography, Uv LED

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* - Corresponding Author

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