Axial Magnetic Field Distribution Simulation and Optimization in Rotating Magnetron Sputtering System

Ruo Fan Zhang; Ren Cheng Wang; Jia Cheng; Yi Jia Lu

doi:10.4028/www.scientific.net/AMM.697.382

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HomeApplied Mechanics and MaterialsApplied Mechanics and Materials Vol. 697Axial Magnetic Field Distribution Simulation and...

Axial Magnetic Field Distribution Simulation and Optimization in Rotating Magnetron Sputtering System

Abstract:

The primary goal of this study is to optimize the dynamic axial magnetic field distribution in magnetron sputtering system, guiding the target ions to project directly to the substrate. A group of electromagnetic coils were set up to generate an auxiliary axial magnetic field. The configuration of axial magnetic field in different electrifying modes on coils were simulated using numerical integration. Based on the general theoretical results, this paper proposed an optimization of coil arrangement and electrifying modes for a C-shape direct current(DC) magnetron. A 3D model of the coils was set up and the finite element analysis results verified the accuracy of theoretical results. Consequently, this study proposed an arrangement and electrified scheme of electromagnetic coils to provide a dynamic auxiliary axial magnetic field, which could match with the shape and movement of the primary magnetron.

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Periodical:

Applied Mechanics and Materials (Volume 697)

Pages:

382-387

DOI:

https://doi.org/10.4028/www.scientific.net/AMM.697.382

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Online since:

November 2014

Authors:

Ruo Fan Zhang, Ren Cheng Wang, Jia Cheng, Yi Jia Lu

Keywords:

Auxiliary Electromagnetic Coils, Axial Magnetic Field, DC Magnetron Sputtering, Electrified Modes

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References

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