Fabrication of TiO2 Films on Glass Substrates by a Pulsed Dc Reactive Magnetron Sputtering
Due to its ability of photocatalysis and photoinduced superhydrophilicity, TiO2 was paid significant attentions in recent years. In this study, TiO2 films were deposited at room temperature and 300 °C by pulsed dc reactive magnetron sputtering. The gas pressure was varied in the range of 0.3-1.1 Pa by filling Ar/N2 gas mixture with the ratio of 1:1. The surface morphologies, phase structure and optical property of the TiO2 films were investigated. TiO2 films with good crystalline quality containing mainly of anatase phase were obtained by deposition using gas pressure of 0.7 Pa at room temperature and gas pressure of 1.5 Pa at 300 °C.
Dongye Sun, Wen-Pei Sung and Ran Chen
Q. M. Wang et al., "Fabrication of TiO2 Films on Glass Substrates by a Pulsed Dc Reactive Magnetron Sputtering", Applied Mechanics and Materials, Vols. 71-78, pp. 5050-5053, 2011