Refractive Index Variation of Fe3O4 Thin Film According to Deposition Rate

Ji Yun Jeong; Young Tae Cho; Yoon Gyo Jung

doi:10.4028/www.scientific.net/AMM.749.106

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HomeApplied Mechanics and MaterialsApplied Mechanics and Materials Vol. 749Refractive Index Variation of Fe3O4 Thin Film...

Refractive Index Variation of Fe₃O₄ Thin Film According to Deposition Rate

Abstract:

Recently, the display industry is focusing on making bendable or flexible displays with higher quality and larger area. Ultimately, there is a very high possibility that future displays will be rollable. The biggest problem with rollable displays is the fabrication of a polarizer film to prevent reflection of the OLED. To develop a rollable display, the display should be made of material with a very thin thickness, like that of paper. However, the thickness of the polarizer film used for displays is only approximately 180 μm. This means that the film is too thick to be applied to rollable displays. If a polarizer of wire grid type, which we investigate in this study, is used, it can reduce the thickness of this film to a value under approximately 1 μm. One research result has been to discover that Fe₃O₄ is a very slightly absorptive material. Especially, most research into Fe₃O₄ thin films has concentrated on its characteristics in nanotubes. So, our purpose in this research is to investigate the deposition process of Fe₃O₄ thin-film under various conditions using an E-beam evaporator; we intend to compare these various processes with each other after measuring the refractive index.

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Periodical:

Applied Mechanics and Materials (Volume 749)

Pages:

106-110

DOI:

https://doi.org/10.4028/www.scientific.net/AMM.749.106

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Online since:

April 2015

Authors:

Ji Yun Jeong, Young Tae Cho*, Yoon Gyo Jung

Keywords:

Deposition, Nanoimprint, Refractive Index, Thin Film, Wire Grid Polarizer

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* - Corresponding Author

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