The Study of Al-N Codoped ZnO Thin Films Prepared by DC Magnetron Sputtering

Haslinda Abdul Hamid; M.N. Abdul Hadi

doi:10.4028/www.scientific.net/AMM.754-755.591

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HomeApplied Mechanics and MaterialsApplied Mechanics and Materials Vols. 754-755The Study of Al-N Codoped ZnO Thin Films Prepared...

The Study of Al-N Codoped ZnO Thin Films Prepared by DC Magnetron Sputtering

Abstract:

The codoped ZnO thin film were deposited by DC magnetron sputtering on silicon (111) followed by annealing treatment at 200 °C and 600 °C for 1 hour in nitrogen and oxygen gas mixture. Structural investigation was carried out by scanning electron microscopy (SEM), atomic force microscopy and x-ray diffraction (XRD). Film roughness and grain shape were found to be correlated with the annealing temperatures.

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Periodical:

Applied Mechanics and Materials (Volumes 754-755)

Pages:

591-594

DOI:

https://doi.org/10.4028/www.scientific.net/AMM.754-755.591

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Online since:

April 2015

Authors:

Haslinda Abdul Hamid, M.N. Abdul Hadi

Keywords:

Codoping, Silicon, Sputtering, Zinc Oxide

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DOI: 10.1002/pssc.200306187

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