Electrohydrodynamic Atomization of Graphene Nano-Suspension

Da Zhi Wang; Li Feng; Yun Long Wei; Jia Chang Cao; Xin Yu Chen; Feng Yu

doi:10.4028/www.scientific.net/AMM.868.236

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HomeApplied Mechanics and MaterialsApplied Mechanics and Materials Vol. 868Electrohydrodynamic Atomization of Graphene...

Electrohydrodynamic Atomization of Graphene Nano-Suspension

Abstract:

In this paper, graphene nanosuspension was spray deposited using electrohydrodynamic atomization (EHDA) technique, and the polydimethylsiloxane (PDMS) was used as the substrate during the EHDA process. The effect of the PDMS substrate before and after oxygen plasma treatment on the characteristics of EHDA was examined. A cone-jet mode of the EHDA of graphene nanosuspension was obtained using the oxygen plasma treated PDMS substrate. In addition graphene films were deposited on the oxygen plasma treated PDMS at different working distances. The lowest sheet resistance of the graphene films is 127Ω·sq^-1. Furthermore, graphene lines at the range of 30μm-170μm were fabricated using the template assisted EHDA deposition method.

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Periodical:

Applied Mechanics and Materials (Volume 868)

Pages:

236-241

DOI:

https://doi.org/10.4028/www.scientific.net/AMM.868.236

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Online since:

July 2017

Authors:

Da Zhi Wang*, Li Feng, Yun Long Wei, Jia Chang Cao, Xin Yu Chen, Feng Yu

Keywords:

Electrohydrodynamic Atomization, Graphene, Oxygen Plasma Modification, PDMS, Sheet Resistance

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