Development of Effective Technique for Irradiating Samples of Thin Films Using the Focused Ion Beam

Aleksandr Kotvitckii; Aleksandr Dubinetc; Konstantin Ermaov; Evgeny B. Modin; Evgeny Vladislavovich Pustovalov; Vladimir S. Plotnikov

doi:10.4028/www.scientific.net/AMR.1025-1026.765

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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 1025-1026Development of Effective Technique for Irradiating...

Development of Effective Technique for Irradiating Samples of Thin Films Using the Focused Ion Beam

Abstract:

In this paper, the technique of irradiation of thin films by Ga+ ions inside of scanning electron microscope, by a focused ion beam is developed. The influence of irradiation on magnetic properties of thin epitaxial films of Co, grown by molecular beam epitaxy in ultrahigh vacuum on a silicon surface with a intermediate layer of copper atoms. It has been shown that low radiation doses lead to an increase of magnetic hardness of the samples. At higher doses, there is a decrease of coercive force, which is apparently due to a change of crystalline structure of the material. An interesting fact is that in the dose range of 10¹²-10¹⁵ the relative remanences is practically unchanged and only at higher doses the magnetic properties of the film worsen.

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Periodical:

Advanced Materials Research (Volumes 1025-1026)

Pages:

765-769

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.1025-1026.765

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Online since:

September 2014

Authors:

Aleksandr Kotvitckii*, Aleksandr Dubinetc, Konstantin Ermaov, Evgeny B. Modin, Evgeny Vladislavovich Pustovalov, Vladimir S. Plotnikov

Keywords:

Electron, Electron Microscopy, Focused Ion Beam, Ion Irradiation of Thin Films, Ion Microscopy, Surface Modification, Thin Magnetic Films

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