Simulation of Temperature Distribution in HFCVD Diamond Films Growth on the Multitudinous Micro End Mills

Bo Song; Bin Shen; Xue Lin Lei; Lei Cheng; Fang Hong Sun

doi:10.4028/www.scientific.net/AMR.1027.163

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HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 1027Simulation of Temperature Distribution in HFCVD...

Simulation of Temperature Distribution in HFCVD Diamond Films Growth on the Multitudinous Micro End Mills

Abstract:

In the process of HFCVD diamond film growth on the multitudinous micro end mills, the uniformity and stability of the temperature distribution have a vital importance on the quality of film. So a new method by using the finite volume is proposed to analyze the importance of different disposition parameters on the uniformity of substrate temperature field. These parameters are filament diameter (d), filament-substrate distance (H), filament separation (S) and filament length (L). The mono-factor method are used to optimize the best parameter combination. The simulation results show that the optimized parameters are d=0.65mm, H=10mm, S=27mm and L=160mm.

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Periodical:

Advanced Materials Research (Volume 1027)

Pages:

163-166

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.1027.163

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Online since:

October 2014

Authors:

Bo Song*, Bin Shen, Xue Lin Lei, Lei Cheng, Fang Hong Sun

Keywords:

Diamond Films, HFCVD, Micro End Mills, Temperature Field

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