Oxidant for Chemical Mechanical Polishing of Single Crystal Diamond

Abstract:

Single crystal diamond is widely used in high-tech fields for its remarkable performance on mechanics, calorifics, optics, acoustics, etc. High-quality diamond surface with small roughness and low scathe are required in these applications. However, the extreme hardness and high chemical inertness of diamond result in severe processing difficulties. Chemical mechanical polishing (CMP) is a promising processing method which can obtain super-smooth and low-damage diamond surface. Oxidant is a key issue for CMP of single crystal diamond. In this study, five different oxidants were used to polish diamond samples. The results indicated that Fenton reagent was an appropriate CMP oxidant and a super-smooth diamond surface of Ra 2.4 nm was achieved by using Fenton reagent in CMP.

• Periodical: Advanced Materials Research (Volume 1027)
• Pages: 80-83
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.1027.80
• Online since: October 2014
• Authors: Zhuo Ying Shi*, Zhu Ji Jin, Hong Ming Xue, Shuang Ji Shi
• Keywords: CMP, Fenton, Oxidant, Single Crystal Diamond, Slurry

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