Determination of Rhodium in Waste Thiourea Rhodium Samples Using Teflon Pressure Vessel-Assisted Sample Digestion and ICP-OES

Zhi Ping Xie; Xiao Juan Wei

doi:10.4028/www.scientific.net/AMR.1033-1034.43

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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 1033-1034Determination of Rhodium in Waste Thiourea Rhodium...

Determination of Rhodium in Waste Thiourea Rhodium Samples Using Teflon Pressure Vessel-Assisted Sample Digestion and ICP-OES

Abstract:

A novel method for the determination of rhodium in waste thiourea rhodium samples was established by inductively coupled plasma optical emission spectrometry after samples digested by Teflon pressure digestion vessel with aqua regia. Such experiment conditions were investigated as the influence of sample dissolution methods, digestion time, digestion temperature and interfering ions on the determination. Under the optimized conditions, the limit of detection (LODs) of Rh for tested solution was 9 ng mL^-1. The relative standard deviations (RSDs) for Rh was 1.98 % (C_Rh = 1 mg L^-1, n = 7). The linear range of calibration graph for Rh was 0 ~ 150.00 mg L^-1. The proposed method was applied to determine the practical samples with good recoveries and satisfactory results.

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Periodical:

Advanced Materials Research (Volumes 1033-1034)

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43-46

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https://doi.org/10.4028/www.scientific.net/AMR.1033-1034.43

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Online since:

October 2014

Authors:

Zhi Ping Xie, Xiao Juan Wei*

Keywords:

Digestion, ICP-OES, Rhodium, Teflon Pressure Digestion Vessel, Waste Thiourea Rhodium

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