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HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 1096Homogenous Thin Films Prepared on Microchannel...

Homogenous Thin Films Prepared on Microchannel Plates via Atomic Layer Deposition

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Abstract:

Oxide thin films such as aluminum oxide doped with zinc (AZO), and aluminum oxide (Al₂O₃) were prepared in the pores of microchannel plate (MCP) by atomic layer deposition (ALD), which is a precise control thin film thickness on substrate with high aspect ratio structure. In this paper, homogenous oxide thin films deposited on varied substrates were prepared by ALD technology under different conditions, and the morphology, element distribution and structure of deposited samples are systematically investigated by scanning electron microscopy (SEM), energy dispersive x-ray (EDX), and x-ray diffraction (XRD) respectively, The results show that ALD technique is a good method to grow homogenous thin films on MCP.

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Research in Area of Materials Science

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Periodical:

Advanced Materials Research (Volume 1096)

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93-97

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.1096.93

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Online since:

April 2015

Authors:

Bao Jun Yan*, Shu Lin Liu, Lu Ping Yang

Keywords:

Atomic Layer Deposition, Microchannel Plates, Thin Film

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© 2015 Trans Tech Publications Ltd. All Rights Reserved

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