Preparation and Characterization of SiO2-Coated TiO2 Thin Films via Sol-Gel Dip Coating Technique

A.K.M. Muaz; U. Hashim; Sharipah Nadzirah; M. Wesam  Al-Mufti; Fatimah Ibrahim; Thong Kwai Lin

doi:10.4028/www.scientific.net/AMR.1109.148

Paper Titles

Effect of Mesoporous Silica Support on the Performance of Copper/Zinc Oxide Catalyst in Hydrogenation of CO₂ to Methanol
p.128

Influence of Deposition Substrate Temperature on Optical and Electrical Properties of In Situ Boron Doped Amorphous Carbon Film for Solar Cell Applications
p.133

Infuence of Nitrogen Gas Flow Rate on Nitrogenated Amorphous Carbon Film for Solar Cell Applications
p.138

Properties of Boron Doped Amorphous Carbon Films at -30 V and -50 V for Carbon Based Solar Cell Applications
p.143

Preparation and Characterization of SiO₂-Coated TiO₂ Thin Films via Sol-Gel Dip Coating Technique
p.148

Electrical Properties of Nano-TiO₂ Thin Film Prepared by Sol-Gel Precipitation Route Using Two-Point Probe Method
p.153

Removal of Iron, Manganese and Boron from Industrial Effluent Water Using Carbon Nanofibers
p.158

The Field Effect of Concentration DNA on Conductance of Silicon Nanowire
p.163

Investigated Effect of Points Charge of the Receptors on the Conduction of Semiconductor Nanowire
p.167

HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 1109Preparation and Characterization of SiO2-Coated...

Preparation and Characterization of SiO₂-Coated TiO₂ Thin Films via Sol-Gel Dip Coating Technique

Abstract:

In the present research, nanocrystalline TiO₂ thin films have been prepared via a sol-gel method using Ti {OCH(CH₃)₂}₄act as a precursor. The morphological effect of sets of as-deposited and annealed samples (100, 300, 500 and 700°C for 1 hour) and thickness variation on the structural properties were investigated by Atomic Force Microscopy (AFM) measurements. The observation showed that the size of grain increases with film thickness, indicating that the size of the particles in the films can be effectively controlled by changing the temperature of thermal treatment. AFM topology images of the as-deposited and annealed TiO₂ films at 100 and 300°C indicates the films are rather smooth, compact, bulky, not uniform and column-like structure. TiO₂ thin films annealed at 500 and 700°C showed homogenous morphology surface with regular size of spherical particles.