Nano-Precision Polishing of Oxygen-Free Copper Using MCF (Magnetic Compound Fluid) Slurry

Abstract:

Oxygen-free copper (OFC) is a popular material used for molds/dies in injection molding of plastic lens because of its high ductility, strong impact strength and good thermal conductivity. nanoprecision polishing is essential as the final process in its fabrication. For this purpose, a novel polishing method using magnetic compound fluid (MCF) slurry was proposed. In this article, the construction of an experimental rig to realize the proposed method was described at first. Then the effects of process parameters including MCF slurry composition, workpiece oscillation parameter f/A_p-p and clearance Δ between workpiece and MCF carrier on work-surface roughness and material removal were experimentally investigated. As a result, nanoprecision surface finish of OFC was successfully attained by polishing with MCF slurry and the optimum process parameters (f/A_p-p=30 Hz/4mm, Δ=0.6 mm with an MCF slurry (45wt.% of CIP, 12 wt.% of Al₂O₃ grain, 3 wt.% of α-cellulose, 40 wt.% of MF) for obtaining the smoothest work-surface were determined.

• Periodical: Advanced Materials Research (Volume 1136)
• Pages: 455-460
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.1136.455
• Online since: January 2016
• Authors: You Liang Wang*, Yong Bo Wu, Mitsuyoshi Nomura
• Keywords: Magnetic Compound Fluid, Magnetic Field, Magnetic Fluid, Magnetorheological Fluid, Material Removal, Polishing, Surface Roughness

References

[1] Information on http: /en. wikipedia. org/wiki/Oxygen-free_copper.

[2] O. C¸ akır, H. Temel, M. Kiyak, Chemical etching of Cu-ETP copper, Journal of Materials Processing Technology. 162–163 (2005) 275–279.

DOI: 10.1016/j.jmatprotec.2005.02.035

[3] Kun Shan, Ping Zhou, Jiqing Cai, Renke Kang, Kang Shi, Dongming Guo, Electrogenerated chemical polishing of copper, Precision Engineering. 39 (2015) 161–166.

DOI: 10.1016/j.precisioneng.2014.08.004

[4] K. Shimada, T. Fujita, H. Oka, Y. Akagami, S. Kamiyama, Hydrodynamic and magnetized characteristics of MCF (magnetic compound fluid) (in Japanese), Transactions of the Japan Society of Mechanical Engineers. 67 (2001) 3034-3040.

DOI: 10.1299/kikaib.67.3034

[5] Yongbo Wu, Youliang Wang, Masakazu Fujimoto, Mitsuyoushi Nomura. Nano-precision polishing of CVD SiC using magnetic compound fluid slurry, Journal of the Korean Society of Manufacturing Technology Engineers. 23 (2014) 547-554.

DOI: 10.7735/ksmte.2014.23.6.547

[6] Kunio Shimada, Yoichi Akagami, Shinichi Kamiyama, Toyohisa Fujita, Toshio Miyazaki, Astushi Shibayama, New Microscopic Polishing with Magnetic Compound Fluid (MCF), Journal of Intelligent Material Systems and Structures. 13 (2002) 405-408.

DOI: 10.1106/104538902026159

[7] Wu Y., Sato T., Lin W., Yamamoto K., Shimada K., Mirror surface finishing of acrylic resin using MCF-based polishing liquid, Int. J. Abras. Technol. 3 (2010) 11-24.

DOI: 10.1504/ijat.2010.032459

[8] T. Furuya, Y. Wu, M. Nomura, K. Shimada, K. Yamamoto, Fundamental performance of magnetic compound fluid polishing liquid in contact-free polishing of metal surface, Journal of Materials Processing Technology. 201 (2008) 536–541.

DOI: 10.1016/j.jmatprotec.2007.11.299

[9] H. Guo, Y. Wu, Behaviors of MCF (Magnetic Compound Fluid) Slurry and its Mechanical Characteristics: Normal and Shearing Forces under a Dynamic Magnetic Field, J. JSEM. 12 (2012) 369-374.