The Effect of Thickness on the Magnetic Anisotropy and Magnetic Properties of Single-Layered FePt Films by In Situ Annealing

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Abstract:

The FePt films with various thicknesses of 5 to 50 nm are deposited on Si(100) substrate without any underlayer by in-situ annealing at substrate temperature (Ts) of 620°C. A strong (001) texture of L10 FePt film is obtained and presents high perpendicular magnetic anisotropy as the film thickness increases to 30 nm. Further increasing the thickness to above 30 nm, the (111) orientation of L10 FePt is enhanced greatly, indicating that the quality of perpendicular magnetic anisotropy degrades when the FePt film is thicker than 30 nm. The single-layered FePt film with thickness of 30 nm by in-situ depositing at 620°C shows good perpendicular magnetic properties (perpendicular coercivity of 14.0 kOe, saturation magnetization of 473 emu/cm3 and perpendicular squareness of 0.96, respectively), which reveal its significant potential as perpendicular magnetic recording media for high-density recording.

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Periodical:

Advanced Materials Research (Volumes 123-125)

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507-510

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August 2010

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© 2010 Trans Tech Publications Ltd. All Rights Reserved

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[1] O.A. Ivanov, L.V. Solina, V.A. Demshina and L.M. Magat: Phys. Met. Metallogr. Vol. 35 (1973). p.81.

Google Scholar

[2] D. Weller, A. Moser, L. Folks, M.E. Best, W. Lee, M.F. Toney, M. Schwickert, J.U. Thiele and M.F. Doerner: IEEE Trans. Magn. Vol. 36 (2000), p.10.

DOI: 10.1109/20.824418

Google Scholar

[3] Y.G. Peng, J.G. Zhu and D.E. Laughlin: J. Appl. Phys. Vol. 99 (2006), p. 08F907.

Google Scholar

[4] Y. Xu, J.S. Chen and J.P. Wang: Appl. Phys. Lett. Vol. 80 (2002), p.3325.

Google Scholar

[5] J.S. Chen, B.C. Lim, Y.F. Ding, J.F. Hu, G.M. Chow and G. Ju: J. Appl. Phys. Vol. 105 (2009), p. 07B702.

Google Scholar

[6] M.F. Toney, W.Y. Lee, J.A. Hedstrom and A. Kellock: J. Appl. Phys. Vol. 93 (2003), p.9902.

Google Scholar

[7] B.D. Cullity: Elements of X-ray Diffraction, second edition, Massachusetts: Addison-Wesley (1978).

Google Scholar

[8] Y. Huang, H. Okumura, G.C. Hadjipanayis and D. Weller: J. Magn. Magn. Mater. Vol. 242-245 (2002), p.317. (a) (b) (c) (d).

Google Scholar