Block Copolymers on a Physically or Chemically Patterned Substrate

Jaeup U. Kim

doi:10.4028/www.scientific.net/AMR.123-125.523

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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 123-125Block Copolymers on a Physically or Chemically...

Block Copolymers on a Physically or Chemically Patterned Substrate

Abstract:

Patterned substrates are good candidates to enhance the arrangement of nanodomains in block copolymer thin films. Here, I theoretically demonstrate the possibility to self-assemble block copolymers on top of physically or chemically patterned substrates. The presence of substrate pattern not only enhances the alignment of polymers, but also induces novel new morphologies which were not present in the bulk phase diagram.

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Advanced Materials Research (Volumes 123-125)

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523-526

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.123-125.523

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Online since:

August 2010

Authors:

Jaeup U. Kim

Keywords:

Block-Copolymer, Patterned Substrate, SCFT, Scherk’s Surface, Thin Film

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References

[1] F. S. Bates and G. H. Fredrickson: Annu, Rev. Phys. Chem. Vol. 41 (1990), p.525.

Google Scholar

[2] F. S. Bates and G. H. Fredrickson: Physics Today Vol. 52 (1999), p.32.

Google Scholar

[3] R. A. Segalman, H. Yokoyama, and E. J. Kramer:, E. J.: Adv. Mater. Vol. 13 (2001), p.1152.

Google Scholar

[4] C. Harrison, D. H. Adamson, Z. Cheng, J. M. Sebastian, S. Sethuraman, D. A. Huse, R. A. Register and P. M. Chaikin: Science Vol. 290 (2000), p.1558.

DOI: 10.1126/science.290.5496.1558

Google Scholar

[5] L. Rockford, Y. Liu, P. Mansky, T. P. Russell, M. Yoon and S. G. J. Mochrie: Phys. Rev. Lett. Vol. 82 (1999), p.2602.

DOI: 10.1103/physrevlett.82.2602

Google Scholar

[6] Y. Tsori and D. Andelman: Macromolecules Vol. 36 (2003), p.8560.

Google Scholar

[7] S. O. Kim, H. H. Solak, M. P. Stoykovich, N. J. Ferrier, J. J. de Pablo and P. F. Nealey: Nature Vol. 424 (2003), p.411.

DOI: 10.1038/nature01775

Google Scholar

[8] S. O. Kim, B. H. Kim, D. Meng, D. O. Shin, C. M. Koo, H. H. Solak and Q. Wang: Adv. Mater. Vol. 19 (2007), p.3271.

Google Scholar

[9] S. Park, D. H. Lee, J. Xu, B. Kim, S. W. Hong, U. Jeong, T. Xu and T. P. Russell: Science Vol. 323 (2009), p.1030.

Google Scholar

[10] S. H. Park, D. O. Shin, B. H. Kim, D. K. Yoon, K. Kim, S. Y. Lee, S. -H. Oh, S. -W. Choi, S. C. Jeon and S. O. Kim: Soft Matter Vol 6, (2010), p.120.

Google Scholar

[11] F. Drolet and G. H. Fredrickson: Phys. Rev. Lett. Vol. 83 (1999) p.4317.

Google Scholar

[12] M. W. Matsen: J. Phys.: Condens. Matter. Vol. 14 (2002) p. R21.

Google Scholar

[13] J. U. Kim and M. W. Matsen: Phys. Rev. Lett. Vol. 102 (2009) p.078303.

Google Scholar

[14] J. U. Kim and M. W. Matsen: Soft Matter Vol. 5 (2009) p.2889.

Google Scholar