Mold Fabricated by Nanoscratching for Nanoimprint Lithography

Abstract:

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The MEMS technology for various nano/micro devices often requires special facilities and complicated and multistage processes, thus the fabrication cost is extremely high. This research aimed to fabricate nanoscale basic structures on silicon substrates using nanoscratching, which can be potentially used to make nano/micro molds for nanoimprint lithography. In this study, various nano/micro-scale structures, such as groove and, single and multiple layer structures were generated on the silicon substrate using an atomic force microscope equipped with a sharp probe made of monocrystalline diamond. The nanoimprint experiment was also performed using the fabricated single-step mold and silicon-resin to fabricate single island structures.

Info:

Periodical:

Advanced Materials Research (Volumes 126-128)

Edited by:

Yunn-Shiuan Liao, Chao-Chang A. Chen, Choung-Lii Chao and Pei-Lum Tso

Pages:

843-848

DOI:

10.4028/www.scientific.net/AMR.126-128.843

Citation:

W. Ohsone et al., "Mold Fabricated by Nanoscratching for Nanoimprint Lithography", Advanced Materials Research, Vols. 126-128, pp. 843-848, 2010

Online since:

August 2010

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Price:

$35.00

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