Preparation and Investigation of Hydrophobic Mesoporous Silica Films
A novel route to prepare hydrophobic mesoporous SiO2 films is reported in this paper. A two step process involving tetraethyl orthosilicate (TEOS) as a precursor and cetyltrimethyl ammonium bromide (CTAB) as a template prepared SiO2 sol catalyzed by hydrochloric acid. The films are prepared by dip-coating process. It has been found that the films have low dielectric constant and good mechanical properties. Preliminary results present a very positive prospective for intermetal dielectric applications.
Zhengyi Jiang, Jingtao Han and Xianghua Liu
Y. J. Cao and Z. F. Wu, "Preparation and Investigation of Hydrophobic Mesoporous Silica Films", Advanced Materials Research, Vols. 152-153, pp. 856-859, 2011