Preparation and Investigation of Hydrophobic Mesoporous Silica Films

Abstract:

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A novel route to prepare hydrophobic mesoporous SiO2 films is reported in this paper. A two step process involving tetraethyl orthosilicate (TEOS) as a precursor and cetyltrimethyl ammonium bromide (CTAB) as a template prepared SiO2 sol catalyzed by hydrochloric acid. The films are prepared by dip-coating process. It has been found that the films have low dielectric constant and good mechanical properties. Preliminary results present a very positive prospective for intermetal dielectric applications.

Info:

Periodical:

Advanced Materials Research (Volumes 152-153)

Edited by:

Zhengyi Jiang, Jingtao Han and Xianghua Liu

Pages:

856-859

DOI:

10.4028/www.scientific.net/AMR.152-153.856

Citation:

Y. J. Cao and Z. F. Wu, "Preparation and Investigation of Hydrophobic Mesoporous Silica Films", Advanced Materials Research, Vols. 152-153, pp. 856-859, 2011

Online since:

October 2010

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Price:

$35.00

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