Effects of Sputtering Parameters on the Properties of Sputtered ZnO Films
The ZnO films were deposited on quartz glass substrate by RF magnetron sputtering. The influences of the deposition power, the Ar/O2 ratio and the total press on the crystallinity of ZnO films were analyzed by X-ray diffraction. The results show that the films deposited at Ar/O2 ratio of 2:3 have better crystalline quality under our experimental conditions. The optimum power is about 120-160 W. The crystal structure was significantly influenced by the total pressure in the chamber. The total press should below 1 Pa in order to get high quality ZnO films.
Guojun Zhang and Jessica Xu
B. Huang and H. D. Yang, "Effects of Sputtering Parameters on the Properties of Sputtered ZnO Films", Advanced Materials Research, Vols. 160-162, pp. 1541-1544, 2011