Effects of Sputtering Parameters on the Properties of Sputtered ZnO Films

Abstract:

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The ZnO films were deposited on quartz glass substrate by RF magnetron sputtering. The influences of the deposition power, the Ar/O2 ratio and the total press on the crystallinity of ZnO films were analyzed by X-ray diffraction. The results show that the films deposited at Ar/O2 ratio of 2:3 have better crystalline quality under our experimental conditions. The optimum power is about 120-160 W. The crystal structure was significantly influenced by the total pressure in the chamber. The total press should below 1 Pa in order to get high quality ZnO films.

Info:

Periodical:

Advanced Materials Research (Volumes 160-162)

Edited by:

Guojun Zhang and Jessica Xu

Pages:

1541-1544

DOI:

10.4028/www.scientific.net/AMR.160-162.1541

Citation:

B. Huang and H. D. Yang, "Effects of Sputtering Parameters on the Properties of Sputtered ZnO Films", Advanced Materials Research, Vols. 160-162, pp. 1541-1544, 2011

Online since:

November 2010

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$35.00

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