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Preparation and its Silica Wafer CMP Performance of Cationic Polyelectrolyte Modified Benzoguanamine Formaldehyde/SiO2 Composite Abrasives Slurry

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Abstract:

In this paper, the adsorption characteristics of cationic polyelectrolyte PDADMAC on BGF particles and Zeta potential of BGF particles have been investigated. A new type of composite abrasive slurry was obtained with cationic polyelectrolyte modified BGF particles and its polishing performance was studied. Experimental results showed that the Zeta potential of the modified BGF particles was changed from negative to positive and the maximum value (+35mv) was obtained when the adsorption saturation was achieved, and the adsorption capacity of SiO2 abrasives on BGF particles was improved significantly as well. The material removal rate was 469nm/min with the modified BGF/ SiO2 composite abrasives slurry containing 5% SiO2 and 3% modified BGF particles, increasing by 47% and 89% than those of the unmodified BGF/SiO2 composite abrasives slurry (319nm/min) and the single silica abrasives slurry (248nm/min), respectively.

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Periodical:

Advanced Materials Research (Volumes 189-193)

Pages:

4158-4162

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.189-193.4158

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Online since:

February 2011

Authors:

Xue Feng Xu, Bin Shan Zhao, Yu Zhi Yang, Quan Guo, Wei Peng

Keywords:

Cationic Polyelectrolyte, Chemical Mechanical Polishing (CMP), Composite Abrasive, Slurry

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© 2011 Trans Tech Publications Ltd. All Rights Reserved

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References

[1] Hiroyuki Yano, Yukiteru Matsui, Gaku Minamihaba, Nobuo Kawahashi1 and Masayuki Hattori1: Mat. Res. Soc. Symp. Proc. Vol. 671(2001), p. M2. 4. 1.

Google Scholar

[2] Xuefeng Xu, Bingxun Ma, Jiande Hu and Wei Peng: Chinese Journal of Mechanical Engineering, Vol. 19, No. 20(2008), p.2407. (In Chinese).

Google Scholar

[3] S. Armini, C. M. Whelan, M. Moinpour and K. Maexb: Electrochemical and Solid-State Letters, 10(9)(2007), p.243-H247.

Google Scholar

[4] J. Ren, J. Shen and S. C. Lu: Science and Technology of Particle Dispersion. (Chemical Industry Press, China 2005).

Google Scholar

[5] Yajun Liu, Yihua Zhu, Suqiu Zhang, Xiaoling Yang: The Chinese Journal of Process Engineering, , Vol. 4. No. 6(2004), p.513. (In Chinese).

Google Scholar

[6] Junjie Yuan, Shuxue Zhou, Bo You, Limin Wu: Chemical Journal of Chinese Universities, Vol. 26. No. 11(2005), p.1998. (In Chinese).

Google Scholar

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