The Structure and Electrochemical Properties of BDD Deposited on Ti Substrate by MWCVD

Abstract:

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In this paper, Boron doped diamond (BDD) thin films have been deposited on Ti substrates by microwave plasma chemical vapour deposition (MWCVD). Raman spectroscopy scanning electron microscopy (SEM) and X-ray diffraction (XRD) examinations demonstrate that the electrode has well-defined diamond features. It is observed that the BDD electrode has a high overpotential 2.5V for water electrolysis prohibiting the evolution of oxygen in the cyclic voltammetry test. Further more,the removal efficiency of chemical oxygen demand (COD) is evaluated by the electrochemical oxidation of wastewater containing phenol.

Info:

Periodical:

Advanced Materials Research (Volumes 189-193)

Edited by:

Zhengyi Jiang, Shanqing Li, Jianmin Zeng, Xiaoping Liao and Daoguo Yang

Pages:

4267-4270

DOI:

10.4028/www.scientific.net/AMR.189-193.4267

Citation:

F. Liu et al., "The Structure and Electrochemical Properties of BDD Deposited on Ti Substrate by MWCVD", Advanced Materials Research, Vols. 189-193, pp. 4267-4270, 2011

Online since:

February 2011

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Price:

$35.00

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