Numerical Modeling of an End-Hall Ion Source

Abstract:

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In an End-Hall source an ion-beam is extracted from a magnetized plasma and accelerated by the plasma electric field without grids. The ion beam of End-Hall sources is not space charge limited and ion current as large as 5 A at relatively low energy (100 V) can be achieved. These properties are very interesting for surface processing applications and thin film technology. Although End-Hall sources are commonly used for these applications, the physics of these sources is only poorly understood and a quantitative and predictive model of their regime of operation is still missing. The two-dimensional self-consistent model of Hall effect thrusters described in Ref. [1] has been adapted to End Hall sources and is used in this paper to describe the principles and main characteristics of these sources.

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Periodical:

Edited by:

El-Hachemi Amara and Djamila Bennaceur-Doumaz

Pages:

144-147

DOI:

10.4028/www.scientific.net/AMR.227.144

Citation:

N. Oudini et al., "Numerical Modeling of an End-Hall Ion Source", Advanced Materials Research, Vol. 227, pp. 144-147, 2011

Online since:

April 2011

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$35.00

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