OES Diagnostics of HMDSO/O2/CF4 Microwave Plasma for SiOCxFy Films Deposition

Rayene Chabane; Salah Sahli; Azziz Zenasni; Patrice Raynaud; Yvan Segui

doi:10.4028/www.scientific.net/AMR.227.152

Paper Titles

Simulation of Geometry and Heat Transfer in a Thin Wall Produced by Direct Laser Powder Deposition
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Modeling the Formation of Periodic Nanostructures on Solid Surface Induced by Femtosecond Laser Ablation by Particle-in-Cell Method
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Numerical Modeling of an End-Hall Ion Source
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Optimization of the Plasma Display Panel Characteristics with PIC-MCC Method
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OES Diagnostics of HMDSO/O₂/CF₄ Microwave Plasma for SiOC_xF_y Films Deposition
p.152

Effect of the Plasma Deposition Parameters on the Properties of Ti/TiC Multilayers for Hard Coatings Applications
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Computation of the Net Emission Coefficient with the Overlapping Lines Consideration on the CH₄-Ar Plasma Discharge
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Modeling of a Ne-Xe-HCl DC Discharge for Excimer Lamp
p.164

Study of the Adhesion and the Thermal Stability of CrN and CrAlN Thin Films
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HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 227OES Diagnostics of HMDSO/O2/CF4 Microwave Plasma...

OES Diagnostics of HMDSO/O₂/CF₄ Microwave Plasma for SiOC_xF_y Films Deposition

Abstract:

SiOF like films have been elaborated in microwave excited DECR plasma reactor (Distributed Electron Cyclotron Resonance) from a mixture of oxygen-hexamethyldisiloxane (HMDSO/O2) and CF4. The fluorine contents in the precursor mixture were adjusted by varying the CF4 gas flow ratio in the range of 10% - 70%. Optical emission spectroscopy (OES) and Fourier transform infrared (FTIR) have been used for the plasma diagnostic and the deposited films structure analysis, respectively. Actinometric technique was used to find trends in the concentrations of species present in the plasma. A large number of species have been detected, such as F, Si, O, C and H. Depending on the gas mixture composition, FTIR spectra revealed the presence of several chemical bonds such as Si-F and Si-O.

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Periodical:

Advanced Materials Research (Volume 227)

Pages:

152-155

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.227.152

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Online since:

April 2011

Authors:

Rayene Chabane, Salah Sahli, Azziz Zenasni, Patrice Raynaud, Yvan Segui

Keywords:

FT-IR, HMDSO, Optical Emission Spectroscopy, PECVD, Plasma

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