Investigation on Thin Films Deposited by PECVD from a DiPhenylMethylSilane (DPMS) Vapors or Mixed with Oxygen for Low-K Material Application

Leila Bouledjnib; Salah Sahli; Azziz Zenasni; Patrice Raynaud; Yvan Segui

doi:10.4028/www.scientific.net/AMR.227.35

Paper Titles

Numerical Study of Butt Joining by Coaxial Powder Injection
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Microstructure and Wear Behaviour of Al/TiB₂ Metal Matrix Composite
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Numerical Simulation of Laser Bending of Thin Plate Stress Analysis and Prediction
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Angular Distribution and Ion Time of Flight Produced on Silicon Target by Laser Irradiation
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Investigation on Thin Films Deposited by PECVD from a DiPhenylMethylSilane (DPMS) Vapors or Mixed with Oxygen for Low-K Material Application
p.35

Enhancement of Blue Spectral Response Intensity of PbS via Polyethylene Oxide-Adding for the Application to White LEDs
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Study of Optical and Structure Properties for Different Composition Tin-Antimony-Selenium Thin Film
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Analyses of Plasmas Produced by Laser Ablation of Fresh Aliments
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On the Electron Distribution Effect of an Expanding Laser Ablated Plasma
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Investigation on Thin Films Deposited by PECVD from a DiPhenylMethylSilane (DPMS) Vapors or Mixed with Oxygen for Low-K Material Application

Abstract:

A new class of low-k materials thin films, deposited from a DiPhenyleMethylSilane (DPMS) vapors was prepared using PECVD technique. These films are elaborated in microwave excited DECR plasma reactor (Distributed Electron Cyclotron Resonance) from pure DiPhenylMethylSilane (DPMS) using various plasma discharge power (100-400 W) or mixed with 50% of oxygen (O2).The improvements of film properties were investigated by capacitance–frequency (C–f), current–voltage (I–V) techniques and Fourier transform infrared spectroscopy (FTIR). The obtained results show that an increase in plasma discharges power from 100 to 400 watts leads to the decrease in dielectric constant value from 4.4 to 3.7 (measured at 10 kHz). The incorporation of oxygen improves the dielectric properties of the films; the dielectric constant value was reduced to 2.9.