Paper Title:
Study of Dry and Wet Oxide Etching for MOSFET-Based MEMS Devices
  Abstract

Withdrawn at author request

  Info
Periodical
Edited by
Lynn Khine and Julius M. Tsai
Pages
152-154
DOI
10.4028/www.scientific.net/AMR.254.152
Online since
May 2011
Export
Price
$35.00
Share

In order to see related information, you need to Login.

In order to see related information, you need to Login.

Chapter 1: Powder Metallurgy
Abstract:Removed by author's request
329
Chapter 3: Product Design and Manufacturing Technologies, Engineering Applications
Abstract:Removed at authors request
612
II. Mechanical Science and Engineering
Abstract:Removed at authors request
247
Chapter 2: Power and Electric Systems, Electronics and Microelectronics, Embedded and Integrated Systems
Abstract:Removed at authors request
866
Chapter 1: Function and Electronic Materials
Abstract:Paper withdrawn at author's request
15