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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 287-290Influence of Substrate Temperature on the...

Influence of Substrate Temperature on the Structural, Electrical and Optical Properties of Al-Doped ZnO Films by RF Magnetron Sputtering

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Abstract:

Transparent conducting aluminum-doped zinc oxide (AZO) films have been prepared on soda-lime glass substrates by radio frequency magnetron sputtering using a high density ceramic target at different substrate temperatures. The structural, morphology, electrical, and optical properties of the AZO thin films were investigated by X-ray diffraction, scanning electron microscope, Hall measurement, and optical transmission spectroscopy, and which were strongly influenced by substrate temperatures. Films with better texture, higher transmission, lower resistivity and larger carrier concentration were obtained for the samples fabricated at higher substrate temperature. The AZO film with the lowest resistivity of 4.63×10⁻⁴ Ω.cm and an average optical transmission of 92% in the visible range was deposited on the substrate heated at 450 °C. The optical bandgap depends on the deposition condition, and was in the range of 3.35~3.59 eV.

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Periodical:

Advanced Materials Research (Volumes 287-290)

Pages:

2308-2313

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.287-290.2308

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Online since:

July 2011

Authors:

Yi Hua Sun, Chen Hui Li, Wei Hao Xiong, Cai Hua Huang

Keywords:

Al-Doped ZnO, Deposition Temperature, Magnetron Sputtering, Transparent Conducting Oxide

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© 2011 Trans Tech Publications Ltd. All Rights Reserved

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