Characterization of Ti-Al-N Films Deposited by Cathodic Vacuum Arc with Different N2 Partial Pressure
A series of Ti-Al-N films were deposited on silicon wafer and steel substrates by cathodic vacuum arc technique in N2/Ar gas mixtures, using a compound Ti(50):Al(50) target. The chemical composition, crystalline microstructure, film deposition rate and surface morphology of the films were investigated by X-ray diffraction (XRD), atomic force microscopy (AFM), scanning electron microscope (SEM) coupled with an energy dispersive X-ray analysis system (EDX), respectively. The hardness and Young’s modulus, wear performance and corrosion behavior of the Ti-Al-N (multi-phase) films at different N2 partial pressure were analyzed and explained on the basis of microstructure, mechanical properties and wear mechanisms.
Jinglong Bu, Pengcheng Wang, Liqun Ai, Xiaoming Sang, Yungang Li
G.P. Zhang et al., "Characterization of Ti-Al-N Films Deposited by Cathodic Vacuum Arc with Different N2 Partial Pressure", Advanced Materials Research, Vols. 287-290, pp. 2429-2433, 2011