Annealing Effects on Microstructure and Thermoelectric Properties of Bi₂(Te_0.95Se_0.05)₃ Thin Films Prepared by Flash Evaporation Method

Abstract:

N-type Bi₂(Te_0.95Se_0.05)₃ thermoelectric thin films with thickness 800 nm have been deposited on glass substrates by flash evaporation method at 473 K. The structures, morphology of the thin films were characterized by X-ray diffraction and field emission scanning electron microscope, respectively. Thermoelectric properties of the thin films have been evaluated by measurements of Seebeck coefficient and electrical resistivity at 300 K. Annealing effect on Seebeck coefficient and electrical resistivity of the thin films was examined in the temperature range 373–573 K. When annealed at 473 K for 1 h, Seebeck coefficient and electrical resistivity are –180 μV/K and 2.7 mΩcm, respectively. Thermoelectric power factor is improved to 12 µW/cmK².

• Periodical: Advanced Materials Research (Volumes 287-290)
• Pages: 2434-2437
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.287-290.2434
• Online since: July 2011
• Authors: Xing Kai Duan, Yue Zhen Jiang
• Keywords: Annealing, Bi₂(te_0.95Se_0.05)₃, Thermoelectric Properties, Thin Film

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