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Patterning of ITO on Glass with Two-Step Using Excimer Laser and Wet Chemical Re-Etching
Abstract:
ITO electrode patterns were fabricated using excimer laser direct-writing technique. The influence of the process parameters (the excimer laser fluence and the stage velocity) on the micromachining quality (the etching depth and ridge height of the edge ) of ITO patterns were experimentally studied. In this paper, the effect of laser fluence and the speed of working platform on the fabrication quality were discussed. The lower laser fluence and suitable platform speed will be very helpful to improve the edge quality of patterning of ITO. However, the recast ridge at the edge also was shown. Use of 39% solution of hydrochloric acid made it possible to further minimize the recast ridge at the edges.
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1393-1398
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July 2011
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© 2011 Trans Tech Publications Ltd. All Rights Reserved
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