Patterning of ITO on Glass with Two-Step Using Excimer Laser and Wet Chemical Re-Etching

Abstract:

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ITO electrode patterns were fabricated using excimer laser direct-writing technique. The influence of the process parameters (the excimer laser fluence and the stage velocity) on the micromachining quality (the etching depth and ridge height of the edge ) of ITO patterns were experimentally studied. In this paper, the effect of laser fluence and the speed of working platform on the fabrication quality were discussed. The lower laser fluence and suitable platform speed will be very helpful to improve the edge quality of patterning of ITO. However, the recast ridge at the edge also was shown. Use of 39% solution of hydrochloric acid made it possible to further minimize the recast ridge at the edges.

Info:

Periodical:

Advanced Materials Research (Volumes 291-294)

Edited by:

Yungang Li, Pengcheng Wang, Liqun Ai, Xiaoming Sang and Jinglong Bu

Pages:

1393-1398

DOI:

10.4028/www.scientific.net/AMR.291-294.1393

Citation:

X. F. Shen et al., "Patterning of ITO on Glass with Two-Step Using Excimer Laser and Wet Chemical Re-Etching", Advanced Materials Research, Vols. 291-294, pp. 1393-1398, 2011

Online since:

July 2011

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Price:

$35.00

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