Research of GaAs Polishing Uniformity on Non-Abrasive Cryogenic Conditions

Abstract:

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In the paper, it is introduced a new method of non-abrasive cryogenic polishing which is used to polish GaAs chips. It is also analyzed the influence of different factors on polishing surfaces and polishing uniformity. The rotate speed of work piece disk is a more important factor on impacting the polishing uniformity than offset e.

Info:

Periodical:

Advanced Materials Research (Volumes 291-294)

Edited by:

Yungang Li, Pengcheng Wang, Liqun Ai, Xiaoming Sang and Jinglong Bu

Pages:

150-154

DOI:

10.4028/www.scientific.net/AMR.291-294.150

Citation:

S. P. Qu et al., "Research of GaAs Polishing Uniformity on Non-Abrasive Cryogenic Conditions", Advanced Materials Research, Vols. 291-294, pp. 150-154, 2011

Online since:

July 2011

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Price:

$35.00

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