Growth and Field Emission Properties of the Carbon Complex Films

Abstract:

The carbon complex film, Which consists of diamond grains, carbon nanotubes, amorphous carbon composition, were fabricated by microwave plasma chemical vapor deposition （MPCVD） method. The ceramic with a Ti mental layer was used as substrate. The carbon complex films were evaluated by Raman scattering spectroscopy, x-ray diffraction spectrum, scanning electron microscope. The field emission properties were tested by using a diode structure in a vacuum. A phosphor-coated indium tin oxide anode was used for observing and characterizing the field emission. The turn-on field was only 0.55V/μm and emission current density as high as 11mA/cm² was obtained under an applied field of 2.18V/μm for the first operation. The growth mechanism and field emission properties of the carbon complex films are discussed relating to microstructure and electrical conductivity.

• Periodical: Advanced Materials Research (Volumes 295-297)
• Pages: 1969-1971
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.295-297.1969
• Online since: July 2011
• Authors: Jin Hai Gao, Zhen Li, Wu Qing Zhang
• Keywords: Carbon Complex Films, Chemical Vapor Deposition (CVD), Field Emission

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