Preparation of N-Doped TiO2/NiO Composite Electrode and its Photoelectrochemcal Characteristics

Chun Tao Wang; Wen Kui Zhang; Hui Huang; Xin Yong Tao

doi:10.4028/www.scientific.net/AMR.306-307.344

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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 306-307Preparation of N-Doped TiO2/NiO Composite...

Preparation of N-Doped TiO₂/NiO Composite Electrode and its Photoelectrochemcal Characteristics

Abstract:

TiO_2-xN_x film was prepared by the combination of sol-gel and spin-coating method on indium-tin oxide (ITO) conducting glass substrate. Then an ITO/TiO_2-xN_x/NiO composite electrode was obtained by chemical bath deposition (CBD). The morphology, crystal structure and composition of the ITO/TiO_2-xN_x film were characterized by SEM, XRD, and XPS. The photoelectrochemical properties of the ITO/TiO_2-xN_x/NiO electrode were evaluated by photocurrent transient measurements and UV-visible transmittance spectra. The results showed that the ITO/TiO_2-xN_x/NiO electrode was sensitive to light and exhibited a noticeable photoelectrochromism.

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Advanced Materials Research (Volumes 306-307)

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344-347

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https://doi.org/10.4028/www.scientific.net/AMR.306-307.344

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August 2011

Authors:

Chun Tao Wang, Wen Kui Zhang, Hui Huang, Xin Yong Tao

Keywords:

Composite Electrode, N-Doped TiO₂, NiO, Photoelectrochemical Characteristics

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