Influence of Annealing Temperature on the Structure and Electrochromic Properties of NiOx Thin Films

Gang Yin Yan; Xin Zhang; Peng Huang; Hua Ran Liu; Buo Xue Feng

doi:10.4028/www.scientific.net/AMR.306-307.372

Paper Titles

Growth and Properties of Cubic Potassium Tantalate Niobate Crystals
p.352

Synthesis, Electronic States, and Electroluminescent Properties of Aluminum Complex Based on Mixed Ligands with 8-Hydroxyquinolinate and Acetylacetone
p.358

Properties of Al Doped ZnO Thin films by DC Reaction Magnetron Sputtering
p.362

Process Research of Amorphous SiO₂ for Optical Fiber Preform by Sol-Gel
p.368

Influence of Annealing Temperature on the Structure and Electrochromic Properties of NiO_x Thin Films
p.372

Effect of Finishing Temperature on Texture Evolution and Magnetic Properties in Heavy Cold Rolled High Silicon Steel Thin Sheets
p.381

ABS Fabrics Chemically Plated by Cu/Ni-P as Electromagnetic Shielding Material
p.385

Transmission Properties of Thue-Morse Quasi-Periodic 1D Superconducting Photonic Crystals
p.389

Magneticbead-Based Enzyme-Linked Immunoassay for Detection Carcinoembryonic Antigen in Gastric Cancer Cells
p.393

HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 306-307Influence of Annealing Temperature on the...

Influence of Annealing Temperature on the Structure and Electrochromic Properties of NiO_x Thin Films

Abstract:

The NiOx thin flims deposited on SnO2/glass substrates by RF sputtering were investigated through XRD、SEM、spectrophotometer and Cyclic voltammetry. The relationship between electrochromic properties and micro-structure of NiOx was also studied. Results show that NiOx films prepared by sputtering are preferred to grow along (200) direction; the crystallize size of NiOx films increases and the transmittance of colored and bleached states of NiOx films also increases with annealing temperature rising, but the transmittance different between bleached and coloured states reduces. The declined electrochromic propertiey of NiOx with the increase of annealing temperature is also found.

You might also be interested in these eBooks

View Preview

Info:

Periodical:

Advanced Materials Research (Volumes 306-307)

Pages:

372-377

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.306-307.372

Citation:

Cite this paper

Online since:

August 2011

Authors:

Gang Yin Yan, Xin Zhang, Peng Huang, Hua Ran Liu, Buo Xue Feng

Keywords:

Annealing Temperature, Electrochromism, NiO_x, RF Sputtering

Export:

RIS, BibTeX

Price:

Permissions CCC:

Request Permissions

Permissions PLS:

Request Permissions

Сopyright:

Citation:

References

[1] H. Sato, T. Minami and S. Takata: Thin Solid Films Vol. 236 (1993), p.14.

Google Scholar

[2] Y. Ushio, A. Ishikawa and T. Niwa: Thin Solid Films Vol. 280 (1996), p.233.

Google Scholar

[3] C. G. Granqvist, in: Handbook of Inorganic Electrochromic Materials, Elsevier, Amsterdam (1995).

Google Scholar

[4] N. Kumagai, M. Matsumoto and K. Toyoda: J. Mater. Sci. Lett Vol.15 (1996), p.1081.

Google Scholar

[5] W. Estrada, A.M. Andersson and C.G. Granqvist: J. Appl. Phys Vol. 64 (1988), p.3678.

Google Scholar

[6] C.M. Lampert: Solar Energy Mater. Vol. 6 (1981), p.1.

Google Scholar

[7] M. Bogner, A. Fuchs and K. Scharnagl: Sens. Actuators. B. Chem. Vol. 47 (1998), p.145.

Google Scholar

[8] S.A. Mahmoud, A.A. Akl and H. Kamal: Physica B Vol. 311 (2002), p.366.

Google Scholar

[9] L.C. Wang, F.L. Meng and Y.F. Sun: J. Inorganic Mater. Vol. 19 (2004), p.1391.

Google Scholar

[10] K. Nakaoka, J. Ueyama and K Ogura: J. Electroanal. Chem Vol. 571 (2004), p.93.

Google Scholar

[11] S.Y. Wu and W.F. Chen: U.S. Patent No. 6,652,980. (2003)

Google Scholar

[12] I. Porqueras and E. Bertran: Thin Solid Films Vol. 398-399 (2001), p.41.

Google Scholar

[13] Y.G. Wu, G.M. Wu and X.Y. Ni: Sol. Energy Mater. Sol. Cells Vol. 63 (2000), p.217.

Google Scholar

[14] X.F. Hu, X.F. Chen and J.F. Tian: J. Inorganic Mater. Vol. 7 (1992), p.356.

Google Scholar

[15] B.D. Cullity in: Elements of X-Ray Diffraction, 2nd edn (University of Notre Dame, 1997)

Google Scholar

[16] J. I. Garcia-Miquel, Q. Zhang and S. J. Allen: Thin Solid Films Vol. 434 (2003), p.165.

Google Scholar