Influence of Hollow Cathode Electron Beam on TiAlN Films Prepared by Multi-Arc Ion Plating

Abstract:

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In this paper,TiAlN films were deposited on the surface of tool steel substrates using multi-arc ion plating technology at the assistance of hollow cathode(HC)electron beam. The influence of hollow cathode electron beam on the phase composition、microstructure and the performance of TiAlN films were studied.The phase composition,microstructure,surface profile and adhesive strength of the films to the substrate were investigated by X-ray diffraction(XRD),scanning electron microscopy(SEM),Profilemeter and UNMT-1 Multi-specimen Test System respectively.The results show that with the increase of the current of the hollow cathode, the preferred orientation of(200)was weakened,and the surface of TiAlN films become smooth and the macroparticals decreased obviously.The hollow cathode electron bean can remarkably improve the adhesive property of TiAlN films,and the scratching test show that the critical load from 38N increase to 61N.

Info:

Periodical:

Advanced Materials Research (Volumes 314-316)

Edited by:

Jian Gao

Pages:

209-213

DOI:

10.4028/www.scientific.net/AMR.314-316.209

Citation:

H. Wu et al., "Influence of Hollow Cathode Electron Beam on TiAlN Films Prepared by Multi-Arc Ion Plating", Advanced Materials Research, Vols. 314-316, pp. 209-213, 2011

Online since:

August 2011

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Price:

$35.00

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