Structural and Optoelectrical Properties of Aluminum-Doped Zinc Oxide Thin Films for Organic Photovoltaic Cells

Abstract:

Thin films of transparent conducting aluminum-doped zinc oxide (ZnO:Al) were grown by rf magnetron sputtering technique using a sintered ceramic target of ZnAl₂O₄. The microstructure and optoelectrical properties of the deposited films were characterized wiyh XRD, four-point probe and spectrophotometer. The results show that the polycrystalline ZnO:Al films consist of the hexagonal crystal structures with c-axis as the preferred growth orientation normal to the substrate, and that the substrate temperature significantly affects the crystal structures and optoelectrical properties of the thin films. The ZnO:Al films deposited at the substrate temperature of 670 K has the relatively well crystallinity, the largest crystal grain, the highest transmittance and the highest figure of merit.

• Periodical: Advanced Materials Research (Volume 337)
• Pages: 532-535
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.337.532
• Online since: September 2011
• Authors: J.H. Gu, Zhi You Zhong, C.Y. Yang
• Keywords: Mircostructure, Optoelectrical Properties, Zinc Oxide Thin Films

References

[1] C.W. Tang: Appl. Phys. Lett. Vol. 48 (1986), p.183

[2] A.J. Breeze, Z. Schlesinger, S.A. Carter and P.J. Brock: Phys. Rev. B Vol. 64 (2001), p.125205

[3] X. Li and D. Tang: J. S.-Cent. Univ. Natl. (Nat. Sci. Ed.) Vol. 28 (2009), p.9

[4] M. Berggren and O. Inganäs: Science Vol. 267 (1995), p.1479

[5] X. Li and Y. Hu: J. S.-Cent. Univ. Natl. (Nat. Sci. Ed.) Vol. 29 (2010), p.6

[6] Z. Zhong: J. S.-Cent. Univ. Natl. (Nat. Sci. Ed.) Vol. 28 (2009), p.73

[7] J.H. Burroughes, D.D.C. Bradley and A.R. Brown: Nature Vol. 347 (1990), p.539

[8] S. Chen, S. Wei, X. He and F. Sun: J. S.-Cent. Univ. Natl. (Nat. Sci. Ed.) Vol. 28 (2009), p.43

[9] J. Hu and R.G. Gordon: J. Appl. Phys. Vol. 71 (1992), p.880

[10] Z. Zhong, J. Gu, X. He and F. Sun: J. S.-Cent. Univ. Natl. (Nat. Sci. Ed.) Vol. 28 (2009), p.33

[11] T. Minami, H. Sato and S. Takata: Jpn. J. Appl. Phys. Vol. 31 (1992), p. L1106

[12] F. Sun and S. Hui: J. S.-Cent. Univ. Natl. (Nat. Sci. Ed.) Vol. 28 (2009), p.10

[13] Y.S. Kim and W.P. Tai: Appl. Surf. Sci. Vol. 253 (2007), p.4911

[14] M. Krunks and E. Mellikov: Thin Solid Films Vol. 270 (1995), p.33

[15] J. Mass, P. Bhattacharya and R.S. Katiyar: Mater. Sci. Eng. B Vol. 103 (2003), p.9

[16] D. Chen, Q. Li and J. Huang: J. S.-Cent. Univ. Natl. (Nat. Sci. Ed.) Vol. 29 (2010), p.14

[17] J.F. Chang and M.H. Hon: Thin Solid Films Vol. 386 (2001), p.79

[18] J. Gu, Z. Zhong, X. He and F. Sun: J. S.-Cent. Univ. Natl. (Nat. Sci. Ed.) Vol. 28 (2009), p.30

[19] S.S. Lin and J.L. Huang: Surf. Coat. Technol. Vol. 185 (2004), p.222

[20] Z. Zhong, J. Gu, X. He and B. Chen: J. S.-Cent. Univ. Natl. (Nat. Sci. Ed.) Vol. 30 (2011), p.64

[21] G. Haacke: J. Appl. Phys. Vol. 47 (1976), p.4086