Preparation of Porous Alumina Abrasives with Different Morphologies and their Chemical Mechanical Polishing Behavior

Xin Wu; Hong Lei; Ru Ling Chen

doi:10.4028/www.scientific.net/AMR.338.415

Paper Titles

Test Methods for Rheological Properties of Self-Compacting Concrete Pastes
p.396

Shock Analysis on Dual-Mass Silicon Micro-Gyroscope
p.401

Influence of Acoustic Coating on the Underwater Sound Radiation of a Double Hull Cylindrical Shell Structure
p.406

A Calculation Method of Vibration Fatigue Life with Coupling Effect
p.411

Preparation of Porous Alumina Abrasives with Different Morphologies and their Chemical Mechanical Polishing Behavior
p.415

Fault Diagnosis of Water Pump Based on Probabilistic Neural Network
p.421

Configuration Optimization and Static Analysis of Adjusting Parallel Mechanism for the Sub-Reflector of Antenna
p.425

Analysis of Multiple Degrees of Freedom Vibration Isolation System Using the State Space Method
p.431

Research on Energy-Saving Technology Based on Optimization of Mechatronic System for Coal Mine
p.436

HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 338Preparation of Porous Alumina Abrasives with...

Preparation of Porous Alumina Abrasives with Different Morphologies and their Chemical Mechanical Polishing Behavior

Abstract:

The traditional solid alumina abrasive has been widely used in commercial slurries. But it is easy to cause polishing scratches due to its dense solid structure. The morphology of the abrasives can also impact on the chemical mechanical polishing (CMP) performances. To improve the CMP performances of the hard disk substrate, rods-like porous alumina and flower-like porous alumina abrasives were prepared and their chemical mechanical polishing behavior investigated. The results showed that the porous alumina abrasives with different morphologies exhibited lower topographical variations and surface roughness than solid alumina abrasives under the same testing conditions.

You might also be interested in these eBooks

View Preview

Info:

Periodical:

Advanced Materials Research (Volume 338)

Pages:

415-420

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.338.415

Citation:

Cite this paper

Online since:

September 2011

Authors:

Xin Wu, Hong Lei, Ru Ling Chen

Keywords:

Chemical Mechanical Polishing (CMP), Different Morphologies, Hard Disk Substrate, Planarization, Porous Alumina Abrasives

Export:

RIS, BibTeX

Price:

Permissions CCC:

Request Permissions

Permissions PLS:

Request Permissions

Сopyright:

Citation:

References

[1] H. Lei, H. Lu, P. Zhang, Z. Zhang, B. Xiao: 7th International Conference on Frontiers of Design and Manufacturing, Guangzhou, China, 2006, pp.445-448.

Google Scholar

[2] Z.F. Zhang, H. Lei: Microelectron. Eng. Vol. 85 (2008), pp.714-720.

Google Scholar

[3] H. Lei, H.S. Lu, J.B. Luo, X.C. Lu: Thin Solid Films Vol. 516 (2008), pp.3005-3008.

Google Scholar

[4] H. Lei, P.Z. Zhang: Appl. Surf. Sci. Vol. 253 (2007), pp.8754-8761.

Google Scholar

[5] C.H. Zhou, L. Shan and R. Hight: Tribol. Trans. Vol. 45 (2002), pp.230-232.

Google Scholar

[6] H. Lei, H.S. Lu, J.B. Luo, X.C. Lu: Chin. J. Mech. Eng. (Engl. Ed.), Vol. 19(2006), pp.496-499.

Google Scholar

[7] H. Lei, Y.L. Zhu, X.F. Tu: J. Funct. Mater. Vol. 36 (2005), pp.1425-1428.

Google Scholar

[8] H.S. Lu, H. Lei: Lubr. Eng. Vol.32(2007), pp.102-104.

Google Scholar

[9] P. Liu, H. Lei, R.L. Chen: Int. J. Abras. Technol. Vol. 3(2010), pp.228-237.

Google Scholar

[10] X.D. Feng, D.C. Sayle, Z.L. Wang: Science, Vol. 312(2006), pp.1504-1508.

Google Scholar

[11] Q. Liu, A.q. Wang, X.d. Wang, T. Zhang: Microporous Mesoporous Mater. Vol.100(2007), pp.35-44.

Google Scholar